Join

Predicting Hydrogen Peroxide concentration for effective control in Ultrapure Water

Date Published 2023 | Conference materials

Log in or Join UltraFacility to access this content

To access our resources you will need to be a member of UltraFacility, log in to your account or purchase a membership to view this content.

Already have an account? Log in

In recent years, the semiconductor industry has tightened its requirements for ultrapure water (UPW) quality, demanding extremely low levels of impurities at the point of use. The presented work describes a novel method for predicting the amount of H2O2 in UPW as a function of flowrate, UV system power level, and background peroxide concentration

Authors: Ferdinando Crapulli,
Tags: UPWUV ReactorHydrogen Peroxide (H2O2)

Related content

UPW journal archive | 2017
Can advanced oxidation technology help control TOC in semiconductor water?
Learn more
Conference material | 2022
What is Known About Urea Control in UPW Systems?​
Learn more
Conference material | 2018
U-PURTM – A Metal-Free Combination of Several UPW Polishing Steps in a Multifunctional Reactor for the Removal of TOC and H2O2 Traces
Learn more
Conference material | 2022
Establishing Correlations between UPW Quality and Particle Deposition on Silicon 300 mm Wafer​
Learn more
Back to Technical Knowledge Base

Not an UltraFacility Member?

Be part of year-round collaboration and knowledge exchange. Get access to the full range of tools leveraged by facility representatives and leading global experts from across the supply chain.

JoinLearn more

Book a demo

Find out how you can leverage UltraFacility Portal to achieve your business objectives today.

Request a demo