On-wafer detection of particles and particle precursors in liquid chemicals

Date Published: 2025 | Conference materials

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Significant gaps in metrology capability for liquid defectivity exist, with insufficient metrology for online speciation of organics, metals, and sub 10nm particles. This presentation outlines the results of particle measurement on high purity chemicals such as IPA, sulfuric acid and TMAH-based developers.

Companies:UNISERS

Authors: Marie Tripp

Tags: High Purity ChemicalsParticle MeasuringIsopropyl Alcohol (IPA)Sulfuric Acid (H2SO4)Tetramethylammonium Hydroxide (TMAH)

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