Amidst the more visible facilities challenges of water, power, and equipment, high purity chemicals have often played second fiddle to topics like ultrapure water (UPW) which have benefited from decades of regulatory focus and industry working groups.

But as chip architecture shrinks to 2nm and below, the industry cannot afford to ignore the growing gap between what fabs need and what suppliers can confidently guarantee when it comes to purity. A roadmap for the future of high purity chemicals is critical to forge a path forwards.

In this webinar, our panel of experts explores:

• Current metrology capabilities and future necessities within the fab
• Where new lab-based methodologies are improving detection
• The developing role of online metrology in catching excursions