Abatement systems account for a significant share of water use in semiconductor fabs, yet much of that demand is driven by particles rather than dissolved contaminants. This presentation shows how targeting particle removal at the point of use can unlock substantial water savings while keeping energy demand low. Using process-specific data and pilot results, it discusses where this approach works best, how it can be integrated with existing abatement infrastructure, and why particle treatment is often the most practical first step toward reducing abatement water consumption and enabling resource recovery.