What is the Future of High Purity Chemicals for the Semiconductor Industry?
As the semiconductor industry advances, escalating device complexity means examining every facet of the manufacturing process to safeguard yield and reliability. Shrinking node sizes demand more and more from manufacturing materials - high purity liquids must meet increasingly stringent requirements, which requires attention throughout the supply chain. Can chemicals manufacturers live up to the challenge and maintain the highest standards of purity throughout the lifecycle of chemicals? How are end-users' needs for high purity materials evolving? This webinar will explore how stakeholders can collaborate to drive forward progress for the high purity materials critical to semiconductor manufacturing.
Speakers
Dr. Ashutosh Bhabhe is the co-founder and CEO of 14Si Solutions, offering expertise in contamination control in process liquids and gases for semiconductor manufacturing. Previous to founding this company, Bhabhe worked as a Wet Etch and Cleans Applications Manager at Entegris Corporation in the Micro Contamination Control Division. He was responsible for development of leading-edge liquid filtration and purification solutions for semiconductor fabs in North America and across the world in wet etch and cleans applications and development of new analytical methods to aid development of filters. He has 11 years of experience in the semiconductor industry, with focus on Photolithography and Wet Etch and Cleans. He received his PhD and M.S in Chemical Engineering from the Ohio State University and a Bachelor’s degree in Chemical Engineering from the National Institute of Technology, Warangal, India. He has co-authored ten publications in peer reviewed scientific journals/conference proceedings.
Nabil Mistkawi
Samsung Austin Semiconductor
Dr. Nabil Mistkawi joined Samsung Austin Semiconductor CC (Cleans/CMP/ EP (Electro Plating)) LSI group in 2016. Since then, he has been leading innovations in chemical formulations and process technology development. He is also steering yield improvement, cost reduction projects, and filtration technology research efforts.
Previously, he was at Intel where he joined in 1993 and was involved in the development of the first Pentium processor and all microprocessor generations that followed. Throughout his career he focused on path finding research efforts in the areas of diffusion, and wet, dry, and gas/vapor phase etching. His work spans from the fundamental materials research and development to the scaling and technology transfer to high volume manufacturing. He has earned numerous Samsung and Intel awards in innovations and process technology development used in various manufacturing processes and microprocessor products.
Archita Sengupta
Intel Corporation
Archita is a Sr. Technologist at Intel, working for about 16 years in process defectivity control program. She has PhD in Physical Chemistry/Chemical Physics. For the past 20 years she has been active voice in industry-consortia-university collaborative programs, such as SRC, SECC, special interest SEMI platforms on supply chain related total contamination control & next gen process development task forces. Archita has portfolio of 90+ internal & external publications & key-note presentations including in prestigious journals “Science” & “Chem Phys letters”, monograph book on Nanoparticle Physics, in SPIE, SEMICON, SPCC, SMC, BACAS, SEMATECH, CMC, AMAT-DC, IMEC, UPM and patents’ portfolio. Archita was among approved Intel FSM COE UofA/GT associate/adjunct honorary faculty & teaches classes at Intel. For past few years, her vision has been “Collaborative Global Supply Line Defectivity Control for Next Generation SEMI processes, & with this regard working with Industry partners driving directives of standards, spec and analytics development.