Silica has long been the limiting factor in pushing reverse osmosis systems to higher recoveries in semiconductor water treatment. This presentation looks at why silica behaves differently from other scales and why conventional antiscalants often fall short in real operating conditions. Using laboratory work, pilot testing, and full-scale case studies, it explores a new approach to disrupting silica polymerization and shows how improved control can reduce cleaning frequency, stabilize performance, and allow higher recoveries that support long-term water efficiency goals.