Applying SPC for Automated Anomaly Detection in Lithography Ultrapure Water Systems

Date Published: 2025 | Conference materials

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This presentation details the development of an anomaly detection system in a UPW system for lithography tools which uses digital tools and deep learning to automate the process.

Companies:Intel

Authors: Manoj Athawale, Patrick Bradley

Tags: UltraPure WaterTotal Organic Carbon (TOC)Metrology and Analytical TechnologyDigital transformation

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