Isopropyl alcohol (IPA) is a critical chemical for the wafer cleaning sequence which in increasingly high demand, and purity requirements are likewise becoming increasingly stringent. Robust characterization and subsequent removal of native contaminants in IPA is therefore vital. Using a broad characterization of technical-grade and high purity IPA can build a complete understanding of the chemistry. This custom approach for contamination characterization, testing and removal provides a systematic approach to the entire supply chain of IPA from raw materials to final usage on wafer.