Gary Van Schooneveld is President of CT Associates, Inc. Gary has over 30 years of experience with high-purity fluid systems including chemical delivery and ultrapure water and the development and testing of their associated materials and components. He is the author or co-author of more than 45 technical papers and presentations. Gary is co-chair of the SEMI UPW Task Force and an active member of the IRDS UPW and IRDS Critical Components Task Forces. Gary as been a key contributor in the development and validation of SEMI specification for measuring filter retention below 15 nm (SEMI C79), particle shedding from critical components (SEMI F104) and extractables ion exchange resin rinse performance (SEMI C93). Gary has BS and MS degrees in Materials Engineering from Rensselaer Polytechnic Institute (Troy, NY) and an MBA from the University of Texas (Arlington, TX).

CT Associates

Dr. Sriram (Ram) Ramamoorthy is a Supply Chain R&D Engineer/Technologist in Intel’s Fab Materials Organization managing specialty chemicals and filtration. Prior to this role, Ram was a senior process technology development engineer in Intel R&D fab in Oregon developing front end wet etch processes. Ram is an active member in IRDS and SEMI task forces and standards team. Ram received his Ph.D in Chemical Engineering from Rensselaer Polytechnic Institute (Troy, NY).

Intel

Bernie Zerfas is a former facilities engineer at GLOBALFOUNDRIES. He has more than 30 years’ experience in the semiconductor industry with a primary focus on UPW and deionized water systems. Although his initial formal training was in chemistry and chemical engineering, he has had a wide variety of formal and informal educational experiences in a variety of technical disciplines. Mr. Zerfas is also an active member of the UPW sub-group of the ITRS; a recent area of focus has been organic and particulate contamination. His current other areas of responsibility include a spectrum of pollution control systems.

With a B.S. in Electrical Engineering and graduate coursework in Optical and Aeronautical Engineering from the University of Colorado, Steve brings over three decades of experience developing and applying advanced particle monitoring and contamination control technologies across semiconductor, aerospace, and defense sectors.


 (Random Hill Publishers, 2005), authoring Chapter 42: 

Particle Monitoring in Semiconductor Manufacturing

 (2nd ed. 2002; 3rd ed. 2015) and has written more than 100 technical papers and application notes.


His technical expertise has supported cleanroom monitoring programs for the Space Shuttle, James Webb Space Telescope, U.S. Air Force, and SpaceX Dragon Crew Module. He has also lectured at leading institutions including SUNY Albany, National Taiwan University, UCLA, University of Texas, and the University of Colorado, covering topics in particle physics and mechanics.


Today, as Global Product Manager at TSI, he continues driving innovation, shaping product strategy, and helping TSI lead the field in precision environmental monitoring and contamination control.

After more than 20 years as water treatment engineer at Rousset plant (France), in charge of subcontractor team (2 engineers, 2 technicians), operating UPW plant and waste water plant, I'm water program manager, technical leader for Ultra Pure Water Water treatment for STMicroelectronics Front-End plants (France, Italy, Singapore) - Technical support (project and troubleshooting) - Quality and monitoring standardization - Water saving focus - Invest technical approval - UPW engineers team coordination Ultra pure water specialist.

STMicroelectronics

Kevin Wolfe is an environmental engineer working within the Global Environmental department at Intel Corporation. He has been working at Intel for 21 years in many environmental health and safety capacities, and currently leads the PFAS working group internal to Intel, and helps to project manage the SIA Semiconductor PFAS Consortium that intends to work towards developing the technical information that will be required to effectively engage with PFAS regulatory restriction efforts.

Dr. Rushikesh (Rushi) Matkar is the Pathfinding Technologist for Water purification at Intel’s R&D Center in Hillsboro, OR and a corporate owner for the leadership roadmap of Intel's water management group. Responsible for driving solutions towards the success of Intel's high volume manufacturing roadmap. He is passionate about high purity delivery of utilities, IOT and advanced manufacturing. Between Academia and Industry, Rushi has extensive experience in bringing new IP to Market. Recently, Rushi successfully led the program to introduce EUV Lithography as a patterning solution for fabrication at Globalfoundries. He has served multiple roles within the leading nodes in technology management, operations and engineering management to help multiple technology nodes meet mass-market benefits.

Ovivo

Alain is a Global Technical Lead and Senior Application Specialist TSI Incorporated, based in Aachen, Germany. With over 30 years in contamination control, cleanroom monitoring, and precision instrumentation, he supports global teams and customers in implementing advanced environmental monitoring strategies across pharmaceutical, semiconductor, and life science industries, including expertise in Facility Monitoring Systems (FMS) Software for real-time data management and compliance.


Before TSI, Alain held senior engineering and project management roles, leading complex cleanroom installations, particle monitoring systems, and facility validation projects. Known for blending technical expertise with practical application, he helps organizations achieve the highest standards of contamination control and regulatory compliance worldwide.


Alain is an active member of ISPE, PDA, IEEE, IRDS, and the UltraFacility community, contributing to industry best practices and innovation in contamination control.

TSI Incorporated

Deena Starkel has B.S. in Environmental Science and M.S. in Environmental Engineering from the University of Idaho. She is a licensed Professional Environmental Engineer with 22+ years of experience in the semiconductor industry as a Facilities Chemical and Water Engineer for Micron Technology. Deena is currently working as a Member of Technical Staff Principal Water Engineer for Micron’s R&D facility and corporate headquarters in Boise, ID and is focused on UPW and wastewater treatment design, process engineering, and operations. Deena has been a member of the UPW IRDS and other groups since 2018.

Micron

Latif joined Intel in 2005 as Microcontamination Engineer for the startup of 45nm process at Fab-32 in Arizona. He has been involved in four more process transfers to Arizona, including the latest 10nm startup. He is technical expert in Microcontamination, including AMC’s, with over 25 years of experience in environmental, semiconductor testing, AMC’s and other Microcontamination problem solving. Prior to joining Intel, Latif worked as a Research Scientist at Balazs Analytical and as a Technical Support Manager at ChemTrace. Latif has participated in collaborative efforts with many chemical and equipment manufacturing companies and organizations including, Sematech, Factory Mutual Research Corporation, in development of criteria for approval of materials suitable for use in semiconductor fabs.

Brad Herbert is a Sr. Process Engineer with Jacobs. Brad’s areas of focus include water management, water reclaim, ultrapure water, wastewater, chemicals, mentoring, and staff development. Over the past 30 years, Brad has worked as a global facilities engineer, site facilities engineer, facilities manager, design consultant, project manager, and product engineer in the semiconductor and water treatment industries. He has led engineering efforts, managed projects, and supported operations throughout The Americas, Europe, and Asia. His work history includes onsemi, LSI Logic, AMD, IDC (CH2M), DeNora Water Technologies, Monsanto, and Sigma-Aldrich. Brad is a licensed Professional Engineer and has a B.S. Degree in Chemical Engineering from the University of Missouri.

Jacobs

Microelectronics UPW Technical Director for Evoqua Water Technologies, LLC. Responsible for process development, optimization, troubleshooting and technical support of high purity water systems within the semiconductor, nanotechnology and solar markets. Also responsible for operating and maintaining an E-1.2 UPW system in the Evoqua Microelectronics Technology Suite. Has been with Evoqua (starting with IWT) for over 37 years in various roles responsible for developing, growing and supporting products and technologies within the Corporate and Industrial segments. These roles include; Product Manager, Process Development Manager and Applications Engineering Manager. Bachelor of Science in Chemical Engineering, with emphasis on high-energy physics, from the University of Wisconsin, Madison, and located at the Evoqua office in Rockford, Illinois. Authored and co-authored several papers on topics including nanofiltration, reverse osmosis, ultrafiltration, advanced oxidation and particle removal for the semiconductor industry.

Scott Covington

Biography

Scott's Technical Resources

More UltraFacility members

Scott Covington

Biography

Scott's Technical Resources

Expect the Unexpected: Avoiding Late-Stage Surprises in Water Projects through System-Level Data Analysis

More UltraFacility members