Global Water Intelligence

Dr. Altun is the co-founder and CEO of UNISERS AG, an ETH Zurich spinoff from Switzerland. UNISERS has been developing a wafer defect inspection and review tool with a sub-10nm detection limit. Dr. Altun has 15-year experience in nanotechnology and optical sensing. Prior to his position at UNISERS AG, he did a Ph.D. at ETH Zurich. He worked at Lawrence Livermore National Laboratories (2011-2014) and Korean Institute of Machinery and Materials (2005-2010). He had his B.Sc. degree from METU (Middle East Tech. Univ.), Turkey and M.Sc. degree at KAIST (Korea Advanced Institute of Science and Technology).

UNISERS

Latif joined Intel in 2005 as Microcontamination Engineer for the startup of 45nm process at Fab-32 in Arizona. He has been involved in four more process transfers to Arizona, including the latest 10nm startup. He is technical expert in Microcontamination, including AMC’s, with over 25 years of experience in environmental, semiconductor testing, AMC’s and other Microcontamination problem solving. Prior to joining Intel, Latif worked as a Research Scientist at Balazs Analytical and as a Technical Support Manager at ChemTrace. Latif has participated in collaborative efforts with many chemical and equipment manufacturing companies and organizations including, Sematech, Factory Mutual Research Corporation, in development of criteria for approval of materials suitable for use in semiconductor fabs.

Intel

Hyeongrak Cho is a water treatment expert and researcher at Kookmin University's Smart Water Environment Leading Laboratory (SWELL). Born in 1986, Cho obtained his Ph.D. in Environmental Engineering from Kookmin University in Seoul, Korea, in September 2019. During his graduate studies, Cho focused his research on the treatment of water, wastewater, and desalination using membranes. In particular, he developed expertise in the treatment of highly concentrated salt wastewater, publishing a paper entitled "Effect of pre-treatment and operating conditions on the performance of membrane distillation for the treatment of shale gas wastewater" in Desalination (IF 6.035). Cho has conducted two successful projects on the treatment of highly concentrated wastewater. The first involved treating shale gas wastewater generated in Texas using the membrane distillation technique, and the second involved treating highly concentrated desalinated seawater using a semi-pilot MD instrument. Manuscripts from these projects are currently being submitted to high-impact water treatment journals. Cho's experience also includes knowledge of MF/UF, coagulation, and sedimentation for pre-treatment and chemical, physical, and ultrasonic washing for post-treatment. He has collaborated on desalination projects involving forward osmosis (FO), reverse osmosis (RO), reverse electrodialysis (RED), and capacitive deionization (CDI). In addition to his research, Cho is studying modeling for the automation of water treatment plants using Cyber-Physical Systems (CPS), Life Cycle Assessment for decreasing Carbon emission, Computational Fluid dynamics, and pipe analysis and design for Ultra pure water supply. Cho believes that his strong understanding of general and next-generation water treatment techniques and his experience in pilot operations make him a valuable asset to any research project.

With a B.S. in Electrical Engineering and graduate coursework in Optical and Aeronautical Engineering from the University of Colorado, Steve brings over three decades of experience developing and applying advanced particle monitoring and contamination control technologies across semiconductor, aerospace, and defense sectors.


 (Random Hill Publishers, 2005), authoring Chapter 42: 

Particle Monitoring in Semiconductor Manufacturing

 (2nd ed. 2002; 3rd ed. 2015) and has written more than 100 technical papers and application notes.


His technical expertise has supported cleanroom monitoring programs for the Space Shuttle, James Webb Space Telescope, U.S. Air Force, and SpaceX Dragon Crew Module. He has also lectured at leading institutions including SUNY Albany, National Taiwan University, UCLA, University of Texas, and the University of Colorado, covering topics in particle physics and mechanics.


Today, as Global Product Manager at TSI, he continues driving innovation, shaping product strategy, and helping TSI lead the field in precision environmental monitoring and contamination control.

Hideaki IINO is a Chief Researcher at KURITA WATER INDUSTRIES LTD, where he currently manages JDP activities with Interuniversity of MicroElectronics Centre (IMEC) in Belgium. I have been more than 10 years in the semiconductor industry on both the UPW technology and wet process business. I began my semiconductor career from developing particle reduction in UPW with a major component supplier, then subsequently learned the water purification and wet clean processes with IMEC. I have a lot of patents and conference presentations. I am a member of the IRDS UPW group.

Kurita Water Industries

Dave Buesser is the COO of FTD Solutions. He is a mechanical engineer from the University of Arizona, and he has spent his entire 27-year career driving advanced technology facilities forward. He began with a focus on semiconductor process piping design and proceeded to build likely the deepest experience in the industry on UPW distribution systems. He has led the design efforts for several UPW plants for greenfield semiconductor facilities and has also led many multi-discipline design teams on microelectronics facilities. Today, his focus is to bring world-class expertise coupled with unique tools to help solve the most pressing UPW and facilities challenges facing advanced industries.

FTD Solutions

Deena Starkel has B.S. in Environmental Science and M.S. in Environmental Engineering from the University of Idaho. She is a licensed Professional Environmental Engineer with 22+ years of experience in the semiconductor industry as a Facilities Chemical and Water Engineer for Micron Technology. Deena is currently working as a Member of Technical Staff Principal Water Engineer for Micron’s R&D facility and corporate headquarters in Boise, ID and is focused on UPW and wastewater treatment design, process engineering, and operations. Deena has been a member of the UPW IRDS and other groups since 2018.

Micron

Please see my LinkedIn profile: https://www.linkedin.com/in/sergei-shatsman/

Project engineer for UPW optimization and conceptual design projects addressing capacity and performance for semiconductor clients. Former UPW system owner at a large semiconductor fabricator.

Adam has been with Nalco Water for over 25 years delivering collaborative solutions to water related challenges. As part of the Global High Tech business unit, he works directly with microelectronics clients to maximize reliability, minimize total cost of operation, and support water circularity. Adam has a B.S. in Chemical Engineering from Montana State University - Bozeman.

Ecolab

Gary Van Schooneveld is President of CT Associates, Inc. Gary has over 30 years of experience with high-purity fluid systems including chemical delivery and ultrapure water and the development and testing of their associated materials and components. He is the author or co-author of more than 45 technical papers and presentations. Gary is co-chair of the SEMI UPW Task Force and an active member of the IRDS UPW and IRDS Critical Components Task Forces. Gary as been a key contributor in the development and validation of SEMI specification for measuring filter retention below 15 nm (SEMI C79), particle shedding from critical components (SEMI F104) and extractables ion exchange resin rinse performance (SEMI C93). Gary has BS and MS degrees in Materials Engineering from Rensselaer Polytechnic Institute (Troy, NY) and an MBA from the University of Texas (Arlington, TX).

CT Associates

Dr. Sriram (Ram) Ramamoorthy is a Supply Chain R&D Engineer/Technologist in Intel’s Fab Materials Organization managing specialty chemicals and filtration. Prior to this role, Ram was a senior process technology development engineer in Intel R&D fab in Oregon developing front end wet etch processes. Ram is an active member in IRDS and SEMI task forces and standards team. Ram received his Ph.D in Chemical Engineering from Rensselaer Polytechnic Institute (Troy, NY).

Alice Young

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