Global Water Intelligence

Brad Herbert is a Sr. Process Engineer with Jacobs. Brad’s areas of focus include water management, water reclaim, ultrapure water, wastewater, chemicals, mentoring, and staff development. Over the past 30 years, Brad has worked as a global facilities engineer, site facilities engineer, facilities manager, design consultant, project manager, and product engineer in the semiconductor and water treatment industries. He has led engineering efforts, managed projects, and supported operations throughout The Americas, Europe, and Asia. His work history includes onsemi, LSI Logic, AMD, IDC (CH2M), DeNora Water Technologies, Monsanto, and Sigma-Aldrich. Brad is a licensed Professional Engineer and has a B.S. Degree in Chemical Engineering from the University of Missouri.

Jacobs

Microelectronics UPW Technical Director for Evoqua Water Technologies, LLC. Responsible for process development, optimization, troubleshooting and technical support of high purity water systems within the semiconductor, nanotechnology and solar markets. Also responsible for operating and maintaining an E-1.2 UPW system in the Evoqua Microelectronics Technology Suite. Has been with Evoqua (starting with IWT) for over 37 years in various roles responsible for developing, growing and supporting products and technologies within the Corporate and Industrial segments. These roles include; Product Manager, Process Development Manager and Applications Engineering Manager. Bachelor of Science in Chemical Engineering, with emphasis on high-energy physics, from the University of Wisconsin, Madison, and located at the Evoqua office in Rockford, Illinois. Authored and co-authored several papers on topics including nanofiltration, reverse osmosis, ultrafiltration, advanced oxidation and particle removal for the semiconductor industry.

Xylem

Dr. Sriram (Ram) Ramamoorthy is a Supply Chain R&D Engineer/Technologist in Intel’s Fab Materials Organization managing specialty chemicals and filtration. Prior to this role, Ram was a senior process technology development engineer in Intel R&D fab in Oregon developing front end wet etch processes. Ram is an active member in IRDS and SEMI task forces and standards team. Ram received his Ph.D in Chemical Engineering from Rensselaer Polytechnic Institute (Troy, NY).

Intel

Bernie Zerfas is a former facilities engineer at GLOBALFOUNDRIES. He has more than 30 years’ experience in the semiconductor industry with a primary focus on UPW and deionized water systems. Although his initial formal training was in chemistry and chemical engineering, he has had a wide variety of formal and informal educational experiences in a variety of technical disciplines. Mr. Zerfas is also an active member of the UPW sub-group of the ITRS; a recent area of focus has been organic and particulate contamination. His current other areas of responsibility include a spectrum of pollution control systems.

Dominic is the Intel Director of Construction responsible for managing Intel’s latest leading edge Wafer FAB construction Program at Intel’s Ocotillo Campus Phoenix AZ. This program is part of Intel’s $20b investment on the campus.


Dominic has 35 years’ experience in EPCC project delivery. 16 years working with EPCC firms Costain, Jacobs, Fluor, DPS and 20 years within Intel.


Dominic holds a BSc in Construction Technology and an MSc in Project management.




Hideaki IINO is a Chief Researcher at KURITA WATER INDUSTRIES LTD, where he currently manages JDP activities with Interuniversity of MicroElectronics Centre (IMEC) in Belgium. I have been more than 10 years in the semiconductor industry on both the UPW technology and wet process business. I began my semiconductor career from developing particle reduction in UPW with a major component supplier, then subsequently learned the water purification and wet clean processes with IMEC. I have a lot of patents and conference presentations. I am a member of the IRDS UPW group.

Kurita Water Industries

Hyeongrak Cho is a water treatment expert and researcher at Kookmin University's Smart Water Environment Leading Laboratory (SWELL). Born in 1986, Cho obtained his Ph.D. in Environmental Engineering from Kookmin University in Seoul, Korea, in September 2019. During his graduate studies, Cho focused his research on the treatment of water, wastewater, and desalination using membranes. In particular, he developed expertise in the treatment of highly concentrated salt wastewater, publishing a paper entitled "Effect of pre-treatment and operating conditions on the performance of membrane distillation for the treatment of shale gas wastewater" in Desalination (IF 6.035). Cho has conducted two successful projects on the treatment of highly concentrated wastewater. The first involved treating shale gas wastewater generated in Texas using the membrane distillation technique, and the second involved treating highly concentrated desalinated seawater using a semi-pilot MD instrument. Manuscripts from these projects are currently being submitted to high-impact water treatment journals. Cho's experience also includes knowledge of MF/UF, coagulation, and sedimentation for pre-treatment and chemical, physical, and ultrasonic washing for post-treatment. He has collaborated on desalination projects involving forward osmosis (FO), reverse osmosis (RO), reverse electrodialysis (RED), and capacitive deionization (CDI). In addition to his research, Cho is studying modeling for the automation of water treatment plants using Cyber-Physical Systems (CPS), Life Cycle Assessment for decreasing Carbon emission, Computational Fluid dynamics, and pipe analysis and design for Ultra pure water supply. Cho believes that his strong understanding of general and next-generation water treatment techniques and his experience in pilot operations make him a valuable asset to any research project.

Gary Van Schooneveld is President of CT Associates, Inc. Gary has over 30 years of experience with high-purity fluid systems including chemical delivery and ultrapure water and the development and testing of their associated materials and components. He is the author or co-author of more than 45 technical papers and presentations. Gary is co-chair of the SEMI UPW Task Force and an active member of the IRDS UPW and IRDS Critical Components Task Forces. Gary as been a key contributor in the development and validation of SEMI specification for measuring filter retention below 15 nm (SEMI C79), particle shedding from critical components (SEMI F104) and extractables ion exchange resin rinse performance (SEMI C93). Gary has BS and MS degrees in Materials Engineering from Rensselaer Polytechnic Institute (Troy, NY) and an MBA from the University of Texas (Arlington, TX).

CT Associates

Dr. Altun is the co-founder and CEO of UNISERS AG, an ETH Zurich spinoff from Switzerland. UNISERS has been developing a wafer defect inspection and review tool with a sub-10nm detection limit. Dr. Altun has 15-year experience in nanotechnology and optical sensing. Prior to his position at UNISERS AG, he did a Ph.D. at ETH Zurich. He worked at Lawrence Livermore National Laboratories (2011-2014) and Korean Institute of Machinery and Materials (2005-2010). He had his B.Sc. degree from METU (Middle East Tech. Univ.), Turkey and M.Sc. degree at KAIST (Korea Advanced Institute of Science and Technology).

UNISERS

Alain is a Global Technical Lead and Senior Application Specialist TSI Incorporated, based in Aachen, Germany. With over 30 years in contamination control, cleanroom monitoring, and precision instrumentation, he supports global teams and customers in implementing advanced environmental monitoring strategies across pharmaceutical, semiconductor, and life science industries, including expertise in Facility Monitoring Systems (FMS) Software for real-time data management and compliance.


Before TSI, Alain held senior engineering and project management roles, leading complex cleanroom installations, particle monitoring systems, and facility validation projects. Known for blending technical expertise with practical application, he helps organizations achieve the highest standards of contamination control and regulatory compliance worldwide.


Alain is an active member of ISPE, PDA, IEEE, IRDS, and the UltraFacility community, contributing to industry best practices and innovation in contamination control.

TSI Incorporated

Dr. Rushikesh (Rushi) Matkar is the Pathfinding Technologist for Water purification at Intel’s R&D Center in Hillsboro, OR and a corporate owner for the leadership roadmap of Intel's water management group. Responsible for driving solutions towards the success of Intel's high volume manufacturing roadmap. He is passionate about high purity delivery of utilities, IOT and advanced manufacturing. Between Academia and Industry, Rushi has extensive experience in bringing new IP to Market. Recently, Rushi successfully led the program to introduce EUV Lithography as a patterning solution for fabrication at Globalfoundries. He has served multiple roles within the leading nodes in technology management, operations and engineering management to help multiple technology nodes meet mass-market benefits.

Ovivo

After more than 20 years as water treatment engineer at Rousset plant (France), in charge of subcontractor team (2 engineers, 2 technicians), operating UPW plant and waste water plant, I'm water program manager, technical leader for Ultra Pure Water Water treatment for STMicroelectronics Front-End plants (France, Italy, Singapore) - Technical support (project and troubleshooting) - Quality and monitoring standardization - Water saving focus - Invest technical approval - UPW engineers team coordination Ultra pure water specialist.

James Head

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